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153nm SilvoFE IITM Technology for "eFlash + eEEPROM"
SilvoFE IITM means Single Low Voltages Flash & EEPROM to enable customers to integrate logice circuit, embedded Flash & embedded EEPROM into a single chip, especially for ultra low power application.
110nm SilvoFE IITM technology was started development since 2024 Q3, and targets to mass production in 2025 Q2.
153nm SilvoFE IITM Advantage
153nm SilvoFE IITM Macro IP in 5V Process Platform
153nm SilvoFE IITM Macro IP Floor-Plan:
153nm SilvoFE IITM Macro IP Spec in 5V Process Platform:
* Macro IP Vdd=2V~5.5V
* eFlash data width x 8 + eEEPROM data width x8
* Macro IP Vdd=2V~5.5V
* eFlash data width x 16 + eEEPROM data width x8
153nm SilvoFE IITM Macro IP Qualification: