SilvoFE IITM refers "Single low voltages Flash+EEPROM, which is the 2nd generation of SilvoFETM tehcnology for making one process to support both eFlash and eEEPROM features. This technoloy only needs extra 3~4 masks based on logic or BCD process.
SilvoFE IITM Technology's Advantages :
• Low Cost
- Cutting edge cell structure with small bitcell size
- 3~4 mask layer
- Customized Macro for embedded and ROM
• Low Voltages (Vdd)
- Maximal voltages at 12V in Macro IP, instead of 15V
- Truly 5V device for logic platform
• Truly EEPROM
- Byte PG/ER opation in array
- High Endurance > 100K PG/ER cycles
- High Data-retention > 20 years@85°C